Electrochemical characterization of TiO2 blocking layers prepared by reactive DC magnetron sputtering
نویسندگان
چکیده
منابع مشابه
DEPOSITION OF THIN TiO2 FILMS BY DC MAGNETRON SPUTTERING METHOD
Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
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CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...
متن کاملStudy of vanadium doped ZnO films prepared by dc reactive magnetron sputtering at different substrate temperatures.
ZnO films doped with vanadium (ZnO:V) have been prepared by dc reactive magnetron sputtering technique at different substrate temperatures (RT-500 degrees C). The effects of the substrate temperature on ZnO:V films properties have been studied. XRD measurements show that only ZnO polycrystalline structure has been obtained, no V2O5 or VO2 crystal phase can be observed. It has been found that th...
متن کاملAlNXOY THIN FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING
AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resis...
متن کاملCorrosion Behaviour of TiN/a-C Superhard Nanocomposite Coatings Prepared by a Reactive DC Magnetron Sputtering Process
Nanocomposite coatings of TiN/a-C were prepared on tool steel substrates using a multitarget reactive DC magnetron sputtering process at various TiN layer thicknesses (0.6–2.8 nm). The a-C layer thickness was approximately 0.45 nm. Structural characterisation of the coatings was done by X-ray diffraction (XRD). Incorporation of an a-C phase in TiN matrix reduced crystallite size of the coatings...
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ژورنال
عنوان ژورنال: Journal of Electroanalytical Chemistry
سال: 2009
ISSN: 1572-6657
DOI: 10.1016/j.jelechem.2009.10.004